https://www.selleckchem.com/products/ipi-549.html The relationship between Al/CuO/NC composites and AP is interaction. © 2020 IOP Publishing Ltd.We develop nano-bridged nanosphere lithography (NB-NSL), a modification to the widely used conventional nanosphere lithography (NSL). Nano-bridges between the polystyrene (PS) spheres of a pristine NSL template are controllably formed in a two-step process (i) spin-coating of a dilute styrene solution on top of the template followed by (ii) oxygen plasma etching of the template. We show that the nanobridge dimensions can be precisely tuned by controlling the pre-processing conditions and the plasma etching time. The resulting lithography templates feature control over the shape and size of the apertures, which determine the morphology of the final nano-island arrays after material deposition and template removal. The unique advantage of NB-NSL is, that PS particle templates based on a single PS particle diameter can be utilized for the fabrication of a variation of nano-island shapes and sizes, whereas conventional NSL yields only bow-tie shaped nano-island with their size being predetermined by the PS particle diameter of the template. © 2020 IOP Publishing Ltd.Despite the huge studies of vacuum devices, nanoscale technologies open new paradigms. The vacuum nanodevices bring multiple advantages, like air instead vacuum for nanometric gap, strong non-linear characteristics and MOS co-integration facility. Therefore, this paper presents the manufacturing process and measured characteristics of a nano-device that uses sub-36 nm gap between two Cr/Au nano-wires. In this way, the metal nano-wires replace the semiconductor nano-islands, while an air gap stands for the "Nothing" region of a first time fabricated variant for a Nothing On Insulator device. The electron-beam lithography mask-less technology is pushed to its technical limit to define a minimum 18 nm wide gap between two Cr/Au nanowires. The main current-voltage curve