https://www.selleckchem.com/products/Amprenavir-(Agenerase).html Laser ablation is capable of removing large volumes of material with micron scale precision at very high speeds. This makes it an ideal tool for the initial stage of preparation of samples for atom probe and electron microscopy studies. However, the thermal nature of the laser ablation process is such that thermal and mechanical damage is induced in the samples in the form of zones of recrystallisation and stress induced deformation. For the analysis of nanometer-sized samples, such as those required for atom probe tomography and transmission electron microscopy, it is necessary to ensure that any damage induced during sample preparation will not introduce artefacts and that specimens are representative of the microstructure of the bulk sample. Here we have undertaken an analysis of the damage caused during sample preparation through a study of pure aluminium and phosphorous doped silicon wafers. Our findings indicate that recrystallisation and stress induced misorientations occur in pure aluminium at the micron scale, however, no detectable damage is observed in the silicon sample.Magnetic induction mapping in the transmission electron microscope using phase contrast techniques such as off-axis electron holography and differential phase contrast imaging often requires the separation of the magnetic contribution to the recorded signal from the electrostatic contribution. When using off-axis electron holography, one of the experimental approaches that can be used to achieve this separation is to evaluate half of the difference between phase shift images that have been recorded before and after turning the sample over. Here, we introduce a cartridge-based sample mounting system, which is based on an existing on-axis tomography specimen holder and can be used to turn a sample over inside the electron microscope, thereby avoiding the need to remove the holder from the microscope to turn the sample over man